Experimental Study of Electrical and Optical Characterizati- on of Aluminum Thin Film Deposited by Physical Vapor Deposition (PVD) Technique on Glass Substrates.

Abstract

Uniform Al thin films were deposited by physical vapor deposition (PVD) technique on glass substrates. The electrical resistivity and reflectance of the films as a function of film thickness and wavelength of light were studied. These parameters have been measured by four-point probe method and UV-Visible Spectrophotometer. The electrical resistivity was obtained by the measurement of current (in mA) and voltage (in mV) through the probe. The results showed that resistivity of the film decreases linearly with the film thickness in the range of the thickness studied. In optical measurement, we have studied mainly reflectance as a function of wavelength of light used.  For most of the Al samples, reflectance was seen as thickness dependent and it was seen minimum at ultraviolet region, high and almost found to be constant from visible to infrared region.  The reflectance of almost Al samples have increased with increased in thickness of films.